bioRxiv · 10.1101/2025.04.25.650569
PIBE: Parallel ion beam etching of sections collected on wafer for ultra large-scale connectomics
Abstract
We developed a parallel ion beam etching device that simultaneously thins hundreds of sections on a whole 4-inch wafer at 20 nm steps, enabling sub-centimeter volumetric imaging with high axial resolution. Compared with traditional volume electron microscopy, PIB preserves in-situ continuity within sections and simplifies inter-section registration. Its high axial resolution facilitates reliable neuron segmentation and tracing with reduced proofreading, providing an efficient route toward ultra-large-scale connectomics, such as whole-mouse-brain reconstruction.
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Ma, H., Lv, Y., Wang, M., Zhao, Z., Zhang, L., Chang, S., Liu, J., Chen, B., Dong, X., Zhang, Y., Guo, J., Chen, H., Zhai, H., Li, L., Chen, X., Han, H.. 2025-04-29. PIBE: Parallel ion beam etching of sections collected on wafer for ultra large-scale connectomics. https://doi.org/10.1101/2025.04.25.650569
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